ASM LB 45 LPCVD & Thermco TMX9001 LPCVD Furnace |
Varian CF3000 Ion Implanter |
ASM LB45 Diffusion Furnace |
SUSS Manual Resist Coater |
For amorphous silicon / low temperature SiO2 deposition |
For source / drain doping |
For N2 anneal / FGA process |
For photoresist coating |
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ASML 5000 Stepper |
SUSS Microtec MA6 |
Hot plates |
Oven |
For photolithography |
For photolithography |
For soft / hard bake |
For soft / hard bake |
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AME8110 Reactive Ion Etcher |
Branson IPC2000 Photo Resist Asher |
Wet Station |
Varian 3180 sputtering |
For silicon / SiO2 dry etching |
For photoresist stripping |
For cleaning / wet etching |
For Al /Al-Si sputtering |
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AJA Sputtering |
J.A. Woollam M-2000V Multi-Wavelength Ellipsometer |
Four Dimensions 280C Four-Point-Probe Mapping System |
Atomic Force Microscope XE150S |
For Nickel sputtering |
For thin film thickness measurement |
For sheet resistance measurement |
For surface roughness measurement |
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